Deposition of nanometric SiOxHyCz films at different substrate temperatures by an atmospheric pressure microwave plasma torch (TIA) : first steps towards self-assembled 3-dimensional nano-sensors - Université de Limoges Accéder directement au contenu
Article Dans Une Revue World Journal of Engineering Année : 2011

Deposition of nanometric SiOxHyCz films at different substrate temperatures by an atmospheric pressure microwave plasma torch (TIA) : first steps towards self-assembled 3-dimensional nano-sensors

Domaines

Matériaux

Pamela Bathias  : Connectez-vous pour contacter le contributeur

https://hal-unilim.archives-ouvertes.fr/hal-00942421

Soumis le : mercredi 5 février 2014-17:32:34

Dernière modification le : vendredi 2 juin 2023-15:14:46

Fichier non déposé

Dates et versions

hal-00942421 , version 1 (05-02-2014)

Identifiants

  • HAL Id : hal-00942421 , version 1

Citer

Xavier Landreau, B. Lanfant, Thérèse Merle-Méjean, G. Bouscarrat, Z. Bouchkour, et al.. Deposition of nanometric SiOxHyCz films at different substrate temperatures by an atmospheric pressure microwave plasma torch (TIA) : first steps towards self-assembled 3-dimensional nano-sensors. World Journal of Engineering, 2011, Proceedings of the 19th Annual International Conference on Composites or Nano-Engeneering (ICCE-19),, pp.747. ⟨hal-00942421⟩

Exporter

BibTeX TEI Dublin Core DC Terms EndNote Datacite

Collections

UNILIM CNRS SPCTS SPCTS-AXE2 SPCTS-AXE3 IPAM INC-CNRS IRCER IRCER-AXE2 IRCER-AXE3 IMPEO
60 Consultations
0 Téléchargements

Partager

Gmail Facebook Twitter LinkedIn More