Deposition of nanometric SiOxHyCz films at different substrate temperatures by an atmospheric pressure microwave plasma torch (TIA) : first steps towards self-assembled 3-dimensional nano-sensors - Université de Limoges Accéder directement au contenu
Article Dans Une Revue World Journal of Engineering Année : 2011

Deposition of nanometric SiOxHyCz films at different substrate temperatures by an atmospheric pressure microwave plasma torch (TIA) : first steps towards self-assembled 3-dimensional nano-sensors

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https://unilim.hal.science/hal-00942421

Soumis le : mercredi 5 février 2014-17:32:34

Dernière modification le : jeudi 11 avril 2024-13:08:14

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hal-00942421 , version 1 (05-02-2014)

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  • HAL Id : hal-00942421 , version 1

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Xavier Landreau, B. Lanfant, Thérèse Merle-Méjean, G. Bouscarrat, Z. Bouchkour, et al.. Deposition of nanometric SiOxHyCz films at different substrate temperatures by an atmospheric pressure microwave plasma torch (TIA) : first steps towards self-assembled 3-dimensional nano-sensors. World Journal of Engineering, 2011, Proceedings of the 19th Annual International Conference on Composites or Nano-Engeneering (ICCE-19),, pp.747. ⟨hal-00942421⟩

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