Effect of low RF bias potential on AlN films obtained by microwave plasma enhanced chemical vapor deposition

Gustavo Sanchez (1) , Pascal Tristant (2) , Christelle Dublanche-Tixier (3) , Florent Tetard (4) , A. Bologna (5)

1 Departamento de Ingeniera de Materiales
2 Axe 2 : procédés de traitements de surface
3 SPCTS - Science des Procédés Céramiques et de Traitements de Surface
4 FINANO
5 Departamento de Ingenieria de Materiales

Domaines: Matériaux

Gustavo Sanchez, Pascal Tristant, Christelle Dublanche-Tixier, Florent Tetard, A. Bologna. Effect of low RF bias potential on AlN films obtained by microwave plasma enhanced chemical vapor deposition. Surface and Coatings Technology, 2013, pp.SCT-18981. ⟨10.1016/j.surfcoat.2013.10⟩. ⟨hal-00985449⟩