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Article dans une revue
Multi-structural TiO2 film synthesised by an atmospheric pressure plasma-enhanced chemical vapour deposition microwave torch
Abstract : In this study, a microwave plasma torch working at atmospheric pressure has been used for TiO2 thin film synthesis. We first optimised the deposition conditions in order to avoid the formation of powder in the plasma phase. Then, the characterisation of the TiO2 films deposited in the optimised conditions revealed that both morphology and phase structure of the film are radial dependent. At the centre, the film is crystallised, exhibiting a well-defined columnar microstructure. Meanwhile, at the periphery, the film is amorphous, with a cauliflower-like structure.
https://hal-unilim.archives-ouvertes.fr/hal-01875369
Contributeur : Beatrice Derory Connectez-vous pour contacter le contributeur
Soumis le : lundi 17 septembre 2018 - 11:54:12
Dernière modification le : mercredi 3 novembre 2021 - 08:39:40
Contributeur : Beatrice Derory Connectez-vous pour contacter le contributeur
Soumis le : lundi 17 septembre 2018 - 11:54:12
Dernière modification le : mercredi 3 novembre 2021 - 08:39:40
