Multi-structural TiO2 film synthesised by an atmospheric pressure plasma-enhanced chemical vapour deposition microwave torch

Y. Gazal (1) , Christelle Dublanche-Tixier (2) , Christophe Chazelas (2) , Maggy Colas (3) , Pierre Carles (4) , Pascal Tristant (2)

1 SPCTS - Science des Procédés Céramiques et de Traitements de Surface
2 SPCTS-AXE2 - Axe 2 : procédés plasmas et lasers
3 SPCTS-AXE3 - Axe 3 : organisation structurale multiéchelle des matériaux
4 SPCTS - Science des Procédés Céramiques et de Traitements de Surface

In this study, a microwave plasma torch working at atmospheric pressure has been used for TiO2 thin film synthesis. We first optimised the deposition conditions in order to avoid the formation of powder in the plasma phase. Then, the characterisation of the TiO2 films deposited in the optimised conditions revealed that both morphology and phase structure of the film are radial dependent. At the centre, the film is crystallised, exhibiting a well-defined columnar microstructure. Meanwhile, at the periphery, the film is amorphous, with a cauliflower-like structure.

Mots clés: Atmospheric Pressure; Plasma-Enhanced Chemical Vapor Deposition; Microwave Plasma Torch; Titanium Dioxide; Thin Film Microstructure

Domaines: Chimie; Matériaux; Sciences de l'ingénieur [physics]; Matériaux; Sciences de l'ingénieur [physics]; Plasmas

Y. Gazal, Christelle Dublanche-Tixier, Christophe Chazelas, Maggy Colas, Pierre Carles, et al.. Multi-structural TiO2 film synthesised by an atmospheric pressure plasma-enhanced chemical vapour deposition microwave torch. Thin Solid Films, 2016, 600, pp.43 - 52. ⟨10.1016/j.tsf.2016.01.011⟩. ⟨hal-01875369⟩