BISMUTH OXIDE THIN FILMS DEPOSITED ON SILICON THROUGH PULSED LASER ABLATION, FOR INFRARED DETECTORS - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Surface Review and Letters Année : 2016

BISMUTH OXIDE THIN FILMS DEPOSITED ON SILICON THROUGH PULSED LASER ABLATION, FOR INFRARED DETECTORS

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hal-01877664 , version 1 (20-09-2018)

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Simona Condurache-Bota, Nicolae Tigau, Mirela Praisler, Catalin Constantinescu. BISMUTH OXIDE THIN FILMS DEPOSITED ON SILICON THROUGH PULSED LASER ABLATION, FOR INFRARED DETECTORS. Surface Review and Letters, 2016, 23 (02), ⟨10.1142/S0218625X15501048⟩. ⟨hal-01877664⟩
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