Preparation of TiO, thin films by pulsed laser deposition for waveguiding applications - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Applied Surface Science Année : 1996

Preparation of TiO, thin films by pulsed laser deposition for waveguiding applications

Résumé

TiO, thin films have been deposited on SiO,/Si, MgO and Al,O, substrates by Pulsed Laser Deposition with a KrF excimer laser from a Wile ceramic target. From X-ray diffraction and Raman spectroscopy, their crystalline structure appear to be mainly anatase. The potentialities of waveguiding properties have been evaluated by measuring refractive index and thickness with m-line spectroscopy.

Domaines

Chimie Matériaux
Fichier principal
Vignette du fichier
Applied Surface Science 96-98 (1996) 836-841.pdf (416.8 Ko) Télécharger le fichier
Origine : Fichiers produits par l'(les) auteur(s)
Loading...

Dates et versions

hal-02296069 , version 1 (05-06-2020)

Identifiants

Citer

C. Garapon, C. Champeaux, J. Mugnier, G. Panczer, P. Marchet, et al.. Preparation of TiO, thin films by pulsed laser deposition for waveguiding applications. Applied Surface Science, 1996, 96-98, pp.836 - 841. ⟨10.1016/0169-4332(95)00593-5⟩. ⟨hal-02296069⟩
14 Consultations
220 Téléchargements

Altmetric

Partager

Gmail Facebook Twitter LinkedIn More