Preparation of TiO, thin films by pulsed laser deposition for waveguiding applications

C. Garapon (1) , C. Champeaux (2) , J. Mugnier (1) , G. Panczer (1) , P. Marchet (2) , A. Catherinot (2) , B. Jacquier (1)

1 LPCML - Laboratoire de Physico-Chimie des Matériaux Luminescents
2 LMCTS - Laboratoire de Matériaux Céramiques et Traitements de Surface

TiO, thin films have been deposited on SiO,/Si, MgO and Al,O, substrates by Pulsed Laser Deposition with a KrF excimer laser from a Wile ceramic target. From X-ray diffraction and Raman spectroscopy, their crystalline structure appear to be mainly anatase. The potentialities of waveguiding properties have been evaluated by measuring refractive index and thickness with m-line spectroscopy.

Domaines: Matériaux

C. Garapon, C. Champeaux, J. Mugnier, G. Panczer, P. Marchet, et al.. Preparation of TiO, thin films by pulsed laser deposition for waveguiding applications. Applied Surface Science, 1996, 96-98, pp.836 - 841. ⟨10.1016/0169-4332(95)00593-5⟩. ⟨hal-02296069⟩