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Low-temperature deposition of TiO2 by atmospheric pressure PECVD towards photoanode elaboration for perovskite and solid-state dye-sensitized solar cells
Abstract : An original low-temperature atmospheric pressure plasma-enhanced chemical vapor deposition process was used to deposit titanium dioxide thin films. The parametric study in dynamic mode deposition aimed at growing an ideal columnar film composed of aligned anatase monocrystals as solar cell photoanode, previously obtained on silicon wafers in static mode deposition. A process parameters optimization was necessary to deposit onto thermally sensitive glass/FTO substrates. In this paper, the morphology, crystallinity and optical transmission of the coatings have been studied. The coatings display a columnar cauliflower-like structure, composed of TiO2 amorphous particles assembly. After deposition, the light transmission properties of the substrate were reduced. As a solution, an ultrasound bath cleaning was set up to enhance the transmitted light through the photoanode.
Littérature citée [21 références]
https://hal-unilim.archives-ouvertes.fr/hal-02408015
Contributeur : Bernard Ratier <>
Soumis le : mardi 29 septembre 2020 - 14:58:16
Dernière modification le : jeudi 1 octobre 2020 - 11:41:33
Contributeur : Bernard Ratier <>
Soumis le : mardi 29 septembre 2020 - 14:58:16
Dernière modification le : jeudi 1 octobre 2020 - 11:41:33
Fichier
pv190007.pdf
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