Low-temperature deposition of TiO2 by atmospheric pressure PECVD towards photoanode elaboration for perovskite and solid-state dye-sensitized solar cells

Amelie Perraudeau (1) , Christelle Dublanche-Tixier (1) , Pascal Tristant (1) , Christophe Chazelas (2) , Sylvain Vedraine (3) , Bernard Ratier (3)

1 IRCER-AXE2 - IRCER - Axe 2 : procédés plasmas et lasers
2 Axe 2 : procédés de traitements de surface
3 XLIM-RFEI - RF-ELITE : RF-Electronique Imprimée pour les Télécommunications et l'Energie

An original low-temperature atmospheric pressure plasma-enhanced chemical vapor deposition process was used to deposit titanium dioxide thin films. The parametric study in dynamic mode deposition aimed at growing an ideal columnar film composed of aligned anatase monocrystals as solar cell photoanode, previously obtained on silicon wafers in static mode deposition. A process parameters optimization was necessary to deposit onto thermally sensitive glass/FTO substrates. In this paper, the morphology, crystallinity and optical transmission of the coatings have been studied. The coatings display a columnar cauliflower-like structure, composed of TiO2 amorphous particles assembly. After deposition, the light transmission properties of the substrate were reduced. As a solution, an ultrasound bath cleaning was set up to enhance the transmitted light through the photoanode.

Mots clés: Atmospheric pressure; plasma-enhanced chemical vapor deposition; microwave plasma torch; Titanium dioxide; perovskite solar cells

Domaines: Physique [physics]

Amelie Perraudeau, Christelle Dublanche-Tixier, Pascal Tristant, Christophe Chazelas, Sylvain Vedraine, et al.. Low-temperature deposition of TiO2 by atmospheric pressure PECVD towards photoanode elaboration for perovskite and solid-state dye-sensitized solar cells. EPJ Photovoltaics, 2019, 10, pp.5. ⟨10.1051/epjpv/2019006⟩. ⟨hal-02408015⟩