Dynamic mode optimization for the deposition of homogeneous TiO2 thin film by atmospheric pressure PECVD using a microwave plasma torch

Amelie Perraudeau (1) , Christelle Dublanche-Tixier (1) , Pascal Tristant (1) , Christophe Chazelas (1)

1 IRCER-AXE2 - IRCER - Axe 2 : procédés plasmas et lasers

Domaines: Chimie; Matériaux; Sciences de l'ingénieur [physics]; Matériaux

Amelie Perraudeau, Christelle Dublanche-Tixier, Pascal Tristant, Christophe Chazelas. Dynamic mode optimization for the deposition of homogeneous TiO2 thin film by atmospheric pressure PECVD using a microwave plasma torch. Applied Surface Science, 2019, 493, pp.703-709. ⟨10.1016/j.apsusc.2019.07.057⟩. ⟨hal-02475685⟩