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Communication Dans Un Congrès Année : 2019

Deposition of titanium dioxide films by atmospheric pressure plasma torch: design of the layer in the view of photovoltaic applications

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hal-02475795 , version 1 (12-02-2020)

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  • HAL Id : hal-02475795 , version 1

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Amelie Perraudeau, Christelle Dublanche-Tixier, Pascal Tristant, Christophe Chazelas, S. Vedraine, et al.. Deposition of titanium dioxide films by atmospheric pressure plasma torch: design of the layer in the view of photovoltaic applications. Plathinium 2019, Sep 2019, Antibes, France. ⟨hal-02475795⟩
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