Optimized nc-Si:H thin films with enhanced optoelectronic properties prepared by micro-waves PECVD used as an effective silicon surface passivation layer

Seif El Whibi , Lotfi Derbali , Pascal Tristant (1) , Cédric Jaoul (1) , Maggy Colas (2) , Richard Mayet (3) , Julie Cornette (2) , Hatem Ezzaouia (4)

1 IRCER-AXE2 - IRCER - Axe 2 : procédés plasmas et lasers
2 IRCER-AXE3 - IRCER - Axe 3 : organisation structurale multiéchelle des matériaux
3 IRCER - Institut de Recherche sur les CERamiques
4 LSNTA - Laboratory of Semiconductors, Nanostructures and Advanced Technology

Domaines: Chimie; Matériaux; Sciences de l'ingénieur [physics]; Matériaux

Seif El Whibi, Lotfi Derbali, Pascal Tristant, Cédric Jaoul, Maggy Colas, et al.. Optimized nc-Si:H thin films with enhanced optoelectronic properties prepared by micro-waves PECVD used as an effective silicon surface passivation layer. Journal of Materials Science: Materials in Electronics, 2019, 30 (3), pp.2351-2359. ⟨10.1007/s10854-018-0508-9⟩. ⟨hal-02172223⟩