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Elaboration of an aluminum oxide thin film deposited by magnetron sputtering on boron nitride substrates: role of the physical and chemical properties of BN substrates

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hal-02409034 , version 1 (13-12-2019)

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Mariana Trujillo Arredondo, Cédric Jaoul, Sylvain Maine, Olivier Rapaud, Pascal Tristant. Elaboration of an aluminum oxide thin film deposited by magnetron sputtering on boron nitride substrates: role of the physical and chemical properties of BN substrates. XVI ECerS Conference 2019, Jun 2019, Torino, Italy. ⟨hal-02409034⟩
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