A study on controllable aluminum doped zinc oxide patterning by chemical etching for MEMS application

A.A Ralib , A.N Nordin , N.A Malik , R Othman , A.H.M Zahirul Alam , S Khan , Oussama Mortada (1) , Aurelian Crunteanu (1) , Jean-Christophe Orlianges (2) , Matthieu Chatras (1) , Pierre Blondy (1)

1 XLIM-RFEI - RF-ELITE : RF-Electronique Imprimée pour les Télécommunications et l'Energie
2 Axe 2 : procédés de traitements de surface

Domaines: Electronique

A.A Ralib, A.N Nordin, N.A Malik, R Othman, A.H.M Zahirul Alam, et al.. A study on controllable aluminum doped zinc oxide patterning by chemical etching for MEMS application . Microsystem Technologies, 2016, ⟨10.1007/s00542-015-2783-1⟩. ⟨hal-01264439⟩